포토레지스터는 2000 rpm의 회전속도로 코팅하였고, 110℃

포토레지스터는 2000 rpm의 회전속도로 코팅하였고, 110℃ 에서 60초 동안 건조한 후에 포토 마스크(Photomask)를 씌우고 50 mJ/cm2의 빛에서 노광 처리하였다.

ผลลัพธ์ (อังกฤษ) 1:

Photoresist is a rotation speed of 2000 rpm was coated, 110 ℃ photomask for 60 seconds after dry (photomask) putting a 50 mj/cm2 exposure to the light treatment.

ผลลัพธ์ (อังกฤษ) 2:

Photo resistor 2000 rpm rotation speed coating and 110℃ after dry for 60 seconds in photomask (Photomask) putting on 50 m J/cm 2, from light exposure process.

ผลลัพธ์ (อังกฤษ) 3:

Photo registers coated with 2000 RPM rotational speed, and for 60 seconds at 110 degrees Centigrade C dry after the photo mask (Photomask) Cover 50 mJ/cm 2 in light of the optical processing.