노광은 요구하는 패턴의 선 폭을 가지도록 제작한 포토 마스크 필

노광은 요구하는 패턴의 선 폭을 가지도록 제작한 포토 마스크 필름을 사용하여 기판에 패턴을 전사한다.

ผลลัพธ์ (อังกฤษ) 1:

The exposure is required to have a line width of a pattern produced using the photomask film with a pattern transferred onto a substrate.

ผลลัพธ์ (อังกฤษ) 2:

Exposure is required to have the line width of the pattern produced by the photomask substrate using the pattern film Warrior.

ผลลัพธ์ (อังกฤษ) 3:

The union is demanding the pattern-width to have produced photo mask substrate using the patterns on film to be dead.